Wet etching equipment and wet etching method

The invention provides wet etching equipment and a wet etching method, and relates to the technical field of microelectronic processing equipment.The wet etching equipment comprises an etching groove used for containing etching liquid; the support is located above a groove opening of the etching groove, the support is used for fixing a substrate and immersing a to-be-etched part of the substrate into the etching liquid, the support comprises a bearing face for fixing the substrate, the bearing face is parallel to the liquid level of the etching liquid in the etching groove, and the bearing face is higher than the liquid level of the etching liquid. In the invention, the bearing surface of the bracket is parallel to the liquid level of the etching liquid in the etching tank, and after the substrate is fixed on the bearing surface of the bracket, the height of the bracket relative to the liquid level of the etching liquid can be adjusted, so that the effect that the to-be-etched part of the substrate is immerse