Magnetron sputtering coating equipment

The invention provides magnetron sputtering coating equipment, and relates to the technical field of semiconductor processing devices. The device at least comprises a vacuum sample injection chamber, a vacuum coating chamber and a sample vacuum transmission channel, the sample vacuum transmission channel is connected with the vacuum sample injection chamber and the vacuum coating chamber so as to transmit a sample in the vacuum sample injection chamber into the vacuum coating chamber for coating; the sample conveying device is used for conveying a sample to the heatable sample carrying table from the outside, and the heatable sample carrying table is suitable for preheating the sample; a magnetron sputtering gun head is arranged above a sample tray of the coating cavity and is used for carrying out magnetron sputtering coating on a sample; the carrying table is arranged in the vacuum coating cavity in a lifting manner so as to control the height between the sample and the magnetron sputtering gun head; and th