Molecular dynamics-based CuCr contact material ablation resistance characterization and doping design method

The invention belongs to the field of electrical equipment material science, and particularly relates to a CuCr contact material ablation resistance characterization and doping design method based on molecular dynamics. The method comprises the following steps: firstly, constructing a CuCr alloy and...

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Hauptverfasser: CHEN JIANING, FENG DAWEI, WANG SHUHUI, WANG YUMING, FU XINYE
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention belongs to the field of electrical equipment material science, and particularly relates to a CuCr contact material ablation resistance characterization and doping design method based on molecular dynamics. The method comprises the following steps: firstly, constructing a CuCr alloy and doped alloy crystal model by using a special quasi-random method; then, the alloy structure is simulated and optimized through Monte Carlo/molecular dynamics hybrid simulation, and a microscopic contact model is constructed according to the alloy structure; further, a molecular dynamics model of vacuum arc ablation is constructed based on the micro contact model, and the ablation quality and the arc erosion degree serve as characterization quantities for measuring the ablation resistance of the CuCr contact material; and finally, performing ablation simulation on each alloy contact under the action of different arc elements to obtain an ablation resistance characterization quantity, and screening out an optimal do