Method for cleaning surface of OLED (Organic Light Emitting Diode) mask

The invention provides a method for cleaning the surface of an OLED (Organic Light Emitting Diode) mask, which comprises the following steps: S1, soaking the mask in an NMP (N-Methyl Pyrrolidone) stock solution for cleaning to remove an organic material on the surface; S2, soaking the mask in a cleaning solution formed by mixing nitric acid, hydrogen peroxide and pure water according to a volume ratio of (0.5-2): (0.5-2): (6-10) for cleaning, controlling the temperature of the cleaning solution to be 20-40 DEG C and the cleaning time to be 0.5-2 hours; and S3, washing and soaking the mask plate with pure water to remove the residual cleaning solution and impurities. The mask plate is cleaned by using the NMP stock solution, the nitric acid hydrogen peroxide aqueous solution and the pure water in sequence, so that organic materials and metal materials on the surface of the mask plate can be effectively removed, the cleanliness of the surface of the mask plate is ensured, and the production yield of OLED device