Cd-MOF material based on amino isonicotinic acid, preparation method and application

The invention discloses a Cd-MOF material based on amino isonicotinic acid, a preparation method and application, and belongs to the technical field of photoelectric materials. The preparation method comprises the following steps: reacting a mixture of cadmium nitrate, 3-amino-4-picolinic acid, N, N...

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Hauptverfasser: CHENG HAORAN, SU LEI, YAN YANGSHUANG, SHAO ZHICHAO, LI LONG, XING ZHENGDAO, LEE KAK-SU, YU XIUTONG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a Cd-MOF material based on amino isonicotinic acid, a preparation method and application, and belongs to the technical field of photoelectric materials. The preparation method comprises the following steps: reacting a mixture of cadmium nitrate, 3-amino-4-picolinic acid, N, N-dimethylformamide, acetonitrile and water in a drying oven at 100 DEG C for 24 hours to obtain yellow strip-shaped crystals, washing the yellow strip-shaped crystals with mother liquor, and drying the yellow strip-shaped crystals to obtain the high-crystallinity MOF material {[Cd2L4 (H2O)]. DMF} n (Cd-MOF). The Cd-MOF material can be prepared through a common hydrothermal process, and the preparation method is simple and easy to implement. The Cd-MOF material has good photoluminescence performance and friction power generation performance, a new choice is provided for photoelectric materials, meanwhile, the application value of the MOF material is expanded, and the prepared Cd-MOF material has good stability. 本发明公