Showerhead panel configuration

A showerhead for processing a substrate includes a backplate and a faceplate attached to the backplate. The panel comprises a first surface facing the back plate, a second surface opposite to the first surface, and a plurality of through holes extending between the first surface and the second surfa...

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Bibliographische Detailangaben
Hauptverfasser:	MARTIN KEITH JOSEPH, LUO BIN, TOPPING STEPHEN, CHENG WEIFENG, SUBRAMONIAM, PRAMOD, BABBAR, YOGESH
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A showerhead for processing a substrate includes a backplate and a faceplate attached to the backplate. The panel comprises a first surface facing the back plate, a second surface opposite to the first surface, and a plurality of through holes extending between the first surface and the second surface. At least one of the first surface and the second surface is at least partially contoured. 一种用于处理衬底的喷头，该喷头包含背板以及附接至该背板的面板。该面板包含面向该背板的第一表面、与该第一表面相对的第二表面、及在该第一表面与该第二表面之间延伸的多个通孔。该第一表面与该第二表面中的至少一者是至少部分地轮廓化的。