Image sensing device and manufacturing method thereof

The invention relates to an image sensing device and a manufacturing method thereof. An image sensing device includes: a substrate layer configured to include an image pixel region and a dummy region disposed separately from the image pixel region; a first light shielding structure configured to cover the substrate layer of the dummy region to block light from being incident on the substrate layer of the dummy region; a color filter layer disposed over the first light shielding structure; and a second light shielding structure configured to block reflected light from entering the image pixel region and disposed above the first light shielding structure, the second light shielding structure extending from the first light shielding structure toward the color filter layer and having a predetermined height allowing the second light shielding structure to pass through the color filter layer. 本申请涉及图像感测装置及其制造方法。一种图像感测装置包括：基板层，其被构造为包括图像像素区域以及与图像像素区域分开设置的虚设区域；第一遮光结构，其被构造为覆盖虚设区域的基板层以阻挡光入射到虚设区域的基板层上；滤色器层，其设置在第一遮光结构上方；以及