Photoetching machine

The invention discloses a photoetching machine, which belongs to the technical field of semiconductor manufacturing equipment, and comprises a light source system, a mask plate loading table, a silicon wafer workpiece table, an isolation hood, a light source system, a mask plate, a mask plate, a mas...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NIU ZHIYUAN, XIE WEN, CHENG ZHI, SHENG NAIYUAN, FU JUNLONG, QIN HONGPENG, CONG MIN, WANG KAICHENG, XU XINGRAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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