Supporting mechanism, vapor deposition equipment and vapor deposition method

The invention relates to the technical field of vapor deposition, in particular to a supporting mechanism, vapor deposition equipment and a vapor deposition method, and aims at solving the problem that in the vapor deposition process, a supporting structure and a to-be-deposited piece make contact i...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WAN QIANG, QIU LINPENG, LIAO JIAHAO, CHAI PAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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