Supporting mechanism, vapor deposition equipment and vapor deposition method

The invention relates to the technical field of vapor deposition, in particular to a supporting mechanism, vapor deposition equipment and a vapor deposition method, and aims at solving the problem that in the vapor deposition process, a supporting structure and a to-be-deposited piece make contact in the same area of the surface of the to-be-deposited piece in the whole process, and a thin film cannot be deposited in the area. At least one set of first supporting columns and at least one set of second supporting columns are arranged on a supporting table of the supporting mechanism, the second supporting columns are arranged on supporting bases on first slopes of first slope sliding blocks, and in the reciprocating sliding process of the first slope sliding blocks, the supporting bases can ascend or descend in the vertical direction; the second supporting plane is higher than or lower than the first supporting plane, the first supporting column and the second supporting column alternately support the to-be-de