Photosensitive resin composition, photocured pattern formed thereby, and display device including photocured pattern

The present invention relates to a photosensitive resin composition, a photocured pattern formed thereby, and a display device comprising the photocured pattern. The photosensitive resin composition contains a photopolymerizable compound, the photopolymerizable compound contains a fluorine-based mon...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHIN KYUUL, LEE HYUN BO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention relates to a photosensitive resin composition, a photocured pattern formed thereby, and a display device comprising the photocured pattern. The photosensitive resin composition contains a photopolymerizable compound, the photopolymerizable compound contains a fluorine-based monomer represented by chemical formula 1, the fluorine-based monomer is contained in an amount of 44 wt% or less with respect to the total weight of the solid content of the photosensitive resin composition, and the refractive index at a wavelength of 550 nm can be controlled to 1.40-1.52. 本发明涉及一种感光性树脂组合物、由此形成的光固化图案以及包含该光固化图案的显示装置。感光性树脂组合物包含光聚合性化合物,光聚合性化合物包含由化学式1表示的氟系单体,相对于感光性树脂组合物固体成分总重量以44重量%以下包含上述氟系单体,可以将550nm波长处的折射率控制在1.40~1.52。