Substrate processing apparatus

The invention relates to a substrate processing apparatus and method. The substrate processing apparatus includes a first drying unit configured to perform a first drying process using a drying fluid on a substrate on which a liquid film is formed; a first fluid supply unit configured to supply a dr...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	LIM EUI-SANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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