Substrate processing apparatus, method of manufacturing semiconductor device, and storage medium

The invention provides a substrate processing apparatus, a method of manufacturing a semiconductor device, and a storage medium, which can effectively heat a substrate by using light emitted from a lamp heater. The substrate processing apparatus includes: a processing container, at least a portion o...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YASUI TAKESHI, INADA TETSUAKI
Format: Patent
Sprache:chi ; eng
Schlagworte:
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