Substrate processing apparatus, method of manufacturing semiconductor device, and storage medium

The invention provides a substrate processing apparatus, a method of manufacturing a semiconductor device, and a storage medium, which can effectively heat a substrate by using light emitted from a lamp heater. The substrate processing apparatus includes: a processing container, at least a portion of which is made of opaque quartz; a substrate mounting table provided inside the processing container or inside a processing space communicating with the inside of the processing container; a lamp heater provided at a position facing the substrate mounting surface of the substrate mounting table; and a plasma generation unit which is provided on the outer periphery of the processing container and which is capable of plasma excitation of a gas in the processing container. 本发明提供一种基板处理装置、半导体装置的制造方法和存储介质，能够利用从灯加热器放射的光对基板有效地加热。基板处理装置具备：处理容器，其至少一部分由不透明石英构成；基板载置台，其设置在所述处理容器内或者与所述处理容器内连通的处理空间内；灯加热器，其设置在与所述基板载置台的基板载置面对置的位置；以及等离子体生成部，其设置于所述处理容器的外周，且能够对所述处理容器内的气体进行等离子体激发。