Photoresist coating device

The invention relates to a photoresist coating device, which comprises a photoresist collecting tank for temporarily storing photoresist; the photoresist supply pipeline is connected to the photoresist collection tank; the pump is connected to the photoresist supply pipeline; the photoresist pressur...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHOI YOHAN, LEE JUN-HEE, KIM HO-GYUN, CHOI HEE-YUN, OH KYOUNG-HWAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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