Photoresist coating device
The invention relates to a photoresist coating device, which comprises a photoresist collecting tank for temporarily storing photoresist; the photoresist supply pipeline is connected to the photoresist collection tank; the pump is connected to the photoresist supply pipeline; the photoresist pressur...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a photoresist coating device, which comprises a photoresist collecting tank for temporarily storing photoresist; the photoresist supply pipeline is connected to the photoresist collection tank; the pump is connected to the photoresist supply pipeline; the photoresist pressurizing equipment is connected to the photoresist supply pipeline at the rear part of the pump; the photoresist circulating pipeline is arranged at the rear part of the photoresist pressurizing equipment, and is used for connecting the photoresist supply pipeline to the photoresist collecting tank; the photoresist discharge pipeline is connected to the photoresist supply pipeline at the rear part of the photoresist circulating pipeline; the photoresist discharge valve is connected to the photoresist discharge pipeline; and a photoresist discharge nozzle connected to the photoresist discharge valve.
一种光刻胶涂覆装置,包括:光刻胶收集罐,临时存储光刻胶;光刻胶供应管道,连接到光刻胶收集罐;泵,连接到光刻胶供应管道;光刻胶加压设备,在泵的后部处连接到光刻胶供应管道;光刻胶循环管道,在光刻胶加压设备的后部处,该光刻胶循环管道将光刻胶供应管 |
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