Method for improving thickness uniformity of oxide film on surface of metal fuse

The invention provides a method for improving the thickness uniformity of an oxide film on the surface of a metal fuse, and the method comprises the steps: 1, providing a substrate, forming a top interlayer dielectric layer on the substrate, forming a metal fuse region in the top interlayer dielectr...

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Bibliographische Detailangaben
Hauptverfasser: ZHENG SHUHONG, WANG LEPING, YOU HONGPIAO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a method for improving the thickness uniformity of an oxide film on the surface of a metal fuse, and the method comprises the steps: 1, providing a substrate, forming a top interlayer dielectric layer on the substrate, forming a metal fuse region in the top interlayer dielectric layer, and forming a plurality of top metal layers on the top interlayer dielectric layer, wherein one top metal layer completely covers the metal fuse area, and then a passivation layer is formed to completely cover the whole top metal layer; step 2, forming a photoresist layer with a metal fuse region pattern on the substrate; 3, after the passivation layer is etched to expose the top metal layer completely covering the metal fuse region, the photoresist layer is removed; step 4, removing the top metal layer completely covering the metal fuse area; and step 5, etching the exposed top interlayer dielectric layer to form a surface oxide film of the metal fuse. A layer of shielding metal is constructed above a me