DISCHARGE APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND ARTICLE MANUFACTURING METHOD

The invention provides a discharge apparatus, a substrate processing apparatus, and an article manufacturing method. The processing unit supplies first selection information for selecting first waveform information among the plurality of pieces of waveform information to the drive circuit, drives th...

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Bibliographische Detailangaben
1. Verfasser: INOMATA YUYA
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a discharge apparatus, a substrate processing apparatus, and an article manufacturing method. The processing unit supplies first selection information for selecting first waveform information among the plurality of pieces of waveform information to the drive circuit, drives the nozzles included in the combinations by the drive circuit in accordance with the first waveform information, and performs a discharge process by performing a liquid discharge operation on the target region a plurality of times, while the discharge process is being performed, the first waveform information is selected from the plurality of pieces of waveform information, and the second waveform information is selected from the plurality of pieces of waveform information. When a defective nozzle for which liquid discharge is defective is detected from the nozzles included in the combination, selection information provided to the drive circuit is rewritten from the first selection information to second selection inf