Photoresist waste liquid recovery device

The invention relates to the technical field of photoresist, and provides a photoresist waste liquid recovery device which comprises a filter cartridge and a plurality of filter screens arranged in the filter cartridge in an up-down layered manner, the lowermost filter screen is fixedly arranged in...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: FENG YANAN, ZHAO PENG, YU WENDA, HE JIANGHUI, HU XUEJIAN, MENG PENG, WANG BAOXING, GUO JIN, JIA CHENGLIN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The invention relates to the technical field of photoresist, and provides a photoresist waste liquid recovery device which comprises a filter cartridge and a plurality of filter screens arranged in the filter cartridge in an up-down layered manner, the lowermost filter screen is fixedly arranged in the filter cartridge, and other filter screens are arranged in the filter cartridge in a sliding manner; the shaft rod is rotationally arranged in the filter cartridge; the winding shaft is arranged on the shaft rod and located above the filter screen on the topmost layer. One end of the pull wire is arranged on the topmost filter screen, and the other end of the pull wire is wound on the winding shaft; the number of the first elastic pieces is multiple, the two ends of each first elastic piece are arranged on the two adjacent filter screens respectively, the first elastic pieces are used for providing force for enabling the filter screens to be close to each other, and after the filter screens are close to each ot