Apparatus and method for delivering multiple waveform signals during plasma processing

Embodiments of the present disclosure generally relate to systems used in semiconductor device manufacturing processes. More specifically, embodiments provided herein generally include apparatuses and methods for synchronizing and controlling delivery of RF bias signals and pulsed voltage waveforms to one or more electrodes within a plasma processing chamber. Embodiments of the present disclosure include methods and apparatus to synchronize a pulsed radio frequency (RF) waveform with a pulsed voltage (PV) waveform such that the pulsed RF waveform is turned on during a first phase of the PV waveform and turned off during a second phase. The first phase of the PV waveform includes a shell collapse phase. The second phase of the PV waveform includes an ionic current phase. 本公开的实施例总体涉及半导体器件制造工艺中使用的系统。更具体地，本文提供的实施例总体包含用于同步并且控制RF偏压信号和脉冲电压波形的输送向等离子体处理腔室内的一个或多个电极的输送的装置和方法。本公开的实施例包含将脉冲射频(RF)波形与脉冲电压(PV)波形同步的方法和装置，使得脉冲RF波形在PV波形的第一阶段期间开启并在第二阶段期间关闭。PV波形的第一阶段包含壳层崩溃阶段。PV波形的第二阶段包含离子电流阶段。