Diaphragm and chemical solution control device

A diaphragm (30) that is applied to a chemical solution control device that controls the flow of a chemical solution used in a semiconductor manufacturing process and that is pressurized by a working gas is provided with: a film section (31) that is formed from a fluororesin that is resistant to the...

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Bibliographische Detailangaben
Hauptverfasser:	KUMAGAI TAKAYUKI, NISHIO YOSHIFUMI, NISHIDA SHIGENOBU, YOSHIDA MASATERU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING CYLINDERS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING PISTONS POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS SEALINGS SEMICONDUCTOR DEVICES THERMAL INSULATION IN GENERAL WEAPONS
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