Diaphragm and chemical solution control device

A diaphragm (30) that is applied to a chemical solution control device that controls the flow of a chemical solution used in a semiconductor manufacturing process and that is pressurized by a working gas is provided with: a film section (31) that is formed from a fluororesin that is resistant to the chemical solution; and a permeation suppression layer (42) that is provided on a surface (31b) of the membrane section on the side pressurized by the working gas and that is more difficult to permeate the working gas than the membrane section. 一种隔膜(30)，其应用于药液控制装置且由工作气体给予加压，所述药液控制装置控制半导体制造工序中使用的药液的流通，其中所述隔膜(30)具备膜部(31)及透过抑制层(42)，所述膜部(31)由对药液具有耐性的氟树脂形成，所述透过抑制层(42)设置于膜部的由工作气体给予加压的一侧的面(31b)并且与膜部相比难以使工作气体透过。