Online plasma cleaning device and cleaning method for LPCVD (Low Pressure Chemical Vapor Deposition) equipment

The invention discloses an online plasma cleaning device and method for LPCVD equipment. A heating furnace body of the device is coaxially nested on the periphery of a quartz reaction furnace, a furnace opening door plate and a furnace door are arranged at a furnace opening of the quartz reaction furnace, an air inlet hole is formed in the furnace door, and an exhaust pipe is arranged on a furnace tail door plate; an electrode lead-in socket connected with the radio frequency power supply assembly is arranged on the furnace mouth door plate, an electrode column and an I CP generator which are connected with each other are arranged on the furnace door, the I CP generator surrounds the periphery of the air inlet end of the quartz tube, and the exhaust end of the quartz tube penetrates through the furnace door; the furnace door is closed, the electrode column is inserted into the electrode introduction socket, the ICP generator is connected with the radio frequency power supply assembly, the quartz tube extends