Vacuum cleaning device and substrate cleaning method

The invention discloses a vacuum cleaning device and a substrate cleaning method. The device comprises an electromagnetic mechanism, a vacuum cleaning cavity, a hollow main shaft, a lifting mechanism and a base table. The electromagnetic mechanism is hermetically arranged at the top of the vacuum cleaning cavity and is externally connected with a radio frequency power supply to excite process gas to form plasma to clean the surface of the substrate; the movable end and the driving end of the lifting mechanism are hermetically arranged inside and outside the vacuum cleaning cavity respectively; the base table is arranged in the vacuum cleaning cavity, the bottom of the base table is connected with the hollow main shaft, the hollow main shaft penetrates through the bottom of the vacuum cleaning cavity in a sealed mode, the lifting mechanism is located above the base table in the vacuum cleaning cavity, and therefore a substrate can be transferred between the mechanical arm and the base table; the side portion o