EUV-permeable film

Provided is an EUV-permeable film having both high EUV transmittance and high IR emission rate. This EUV-permeable film has an EUV transmittance of 80.0% or more at a wavelength of 13.5 nm, and is provided with a main layer having an IR emission rate of 2.0% or more at a wavelength of 2 [mu] m, and...

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Bibliographische Detailangaben
Hauptverfasser:	KONDO ATSUO, TANIMURA SUBARU, KASHIWAYA TOSHIKATSU, CHAEN HIROKI, NAOKI FURURIKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provided is an EUV-permeable film having both high EUV transmittance and high IR emission rate. This EUV-permeable film has an EUV transmittance of 80.0% or more at a wavelength of 13.5 nm, and is provided with a main layer having an IR emission rate of 2.0% or more at a wavelength of 2 [mu] m, and a protective layer that covers at least one surface of the main layer and has an IR transmittance of 70% or more at a wavelength of 2 [mu] m. 本发明提供EUV透过率及IR放射率均较高的EUV透过膜。该EUV透过膜为波长13.5nm处的EUV透过率为80.0％以上的EUV透过膜，其具备：波长2μm处的IR放射率为2.0％以上的主层、以及将主层的至少单面覆盖的波长2μm处的IR透过率为70％以上的保护层。