Ultrahigh vacuum dissociation passivation method

The invention discloses an ultrahigh vacuum dissociation and passivation method. The dissociation and passivation method comprises the steps of laser Bar strip treatment, degassing treatment, cleaning treatment, ultrahigh vacuum dissociation, interface treatment, ultrahigh vacuum passivation treatment and passivation detection. MBE is an ultrahigh-vacuum physical deposition process, an intermediate chemical reaction does not need to be considered, the MBE is not influenced by mass transfer, and epitaxial growth and interruption can be instantaneously controlled by utilizing a gate, so that the components and doping concentration of the film can be quickly adjusted along with the change of a source, and the film can be quickly deposited under the ultrahigh-vacuum condition of over 10 (-7) Pa. The ultrahigh vacuum dissociation machine is used for dissociating the laser, the interface oxidation process can be reduced to the maximum extent, a passivation layer with excellent crystallization quality can be obtaine