Exposure device and calibration method

The invention provides an exposure device and a calibration method, and belongs to the field of photoetching and calibration, an exposure station of the exposure device comprises a movable carrying table, an exposure head, a plurality of calibration plates, an upper camera assembly and a lower camera assembly; the calibration plate is arranged at the periphery of the movable carrying table; the exposure head and the upper camera assembly are arranged above the movable carrying table, and the lower camera assembly is arranged below the movable carrying table and can controllably move in the plane and the Z direction; the calibration method comprises the following steps: exposing three exposure marks on two adjacent sides of the front surface of a plate, overturning the plate and calibrating the position; and after a specified number of plates are calibrated and processed, calibration of the exposure device is corrected. The calibration plate provided with the calibration mark part and the transparent exposure