Defect standard sample for halftone mask HTM and defect detection method

The invention relates to mask defect detection, in particular to a defect standard sample wafer for a halftone mask (HTM) and a defect detection method.The defect standard sample wafer comprises a first pattern single particle representing a to-be-detected pattern area and a second pattern single particle representing a defect pattern area, and the first pattern single particle and the second pattern single particle are symmetrically arranged; pattern main bodies contained in the first pattern single grains and the second pattern single grains are completely consistent, and defect patterns in the second pattern single grains contain defects of different types and different specifications; according to the technical scheme provided by the invention, the defect that the defect standard sample wafer for the halftone mask HTM, which can adapt to the detection precision of an inspection machine and can simultaneously carry out Die to Die inspection and Die to DB inspection, cannot be designed in the prior art can