3D optical phased array structure and photoetching equipment thereof

The invention discloses a 3D optical phased array structure and photoetching equipment thereof, and belongs to the technical field of optical elements, the 3D optical phased array structure comprises a common path branched into a plurality of waveguide paths, and each waveguide path ends at an indep...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KANG DAE-SUNG, WANG JIAJUN, ZHUANG YATING, WANG LIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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