3D optical phased array structure and photoetching equipment thereof
The invention discloses a 3D optical phased array structure and photoetching equipment thereof, and belongs to the technical field of optical elements, the 3D optical phased array structure comprises a common path branched into a plurality of waveguide paths, and each waveguide path ends at an indep...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a 3D optical phased array structure and photoetching equipment thereof, and belongs to the technical field of optical elements, the 3D optical phased array structure comprises a common path branched into a plurality of waveguide paths, and each waveguide path ends at an independent waveguide path in a plurality of edge emitters; the multiple edge emitters are arranged on a first coordinate axis at intervals, the distance between every two edge emitters is aperiodic, the photoetching equipment comprises a base, a plurality of cavities are evenly formed in the circumference of the base, a rotary table is rotationally arranged in each cavity, a negative pressure suction cup is arranged in each rotary table, a wafer is placed on each rotary table, and the edge emitters are arranged on the base. The cross rod rotates above the base, the glue dripping assembly and the drainage assembly are installed on the cross rod, the glue dripping assembly is used for dripping photoresist onto a wafer, a |
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