Chemical vapor deposition device and chemical vapor deposition system

The invention relates to the technical field of chemical vapor deposition, and discloses a chemical vapor deposition device and a chemical vapor deposition system. The chemical vapor deposition device comprises a plurality of cavities and vacuum valve mechanisms, the cavities are sequentially arranged at intervals, each cavity is provided with an extraction opening and a deflation opening, each vacuum valve mechanism is arranged between any two adjacent cavities, and a gate valve element of each vacuum valve mechanism is movably arranged on one side of a mounting plate. The gate valve element has an opening state for communicating two adjacent cavities and a closing state for separating the two adjacent cavities, a cooling water channel is formed in the gate valve element, and a water inlet and a water outlet which are communicated with the cooling water channel are formed in the gate valve element; according to the invention, the corresponding vacuum valve mechanisms are controlled to independently carry out