Comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid
The invention relates to the technical field of resource recycling of waste liquid in the semiconductor industry, in particular to a comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid, and the system comprises a pretreatment unit, an anaerobi...
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| creator | DU YONGXUN HAO FENGBO CAO HAIYAN CONG RIGUO LUO ZHIGANG CHEN SHUANG |
| description | The invention relates to the technical field of resource recycling of waste liquid in the semiconductor industry, in particular to a comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid, and the system comprises a pretreatment unit, an anaerobic unit, a deep treatment unit, a denitrification unit and a sulfuric acid treatment unit. The pretreatment unit, the anaerobic unit, the deep treatment unit and the denitrification unit are sequentially connected to form a treatment part, and the sulfuric acid treatment unit is connected to the treatment part and provides regenerated sulfuric acid for the treatment part. According to the system and the method disclosed by the invention, the semiconductor sulfuric acid waste liquid can be fully purified, and the generated sulfuric acid is utilized; the sulfuric acid waste liquid and the TMAH waste liquid are treated at the same time, other treatment equipment does not need to be additionally arranged, and the equipm |
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The pretreatment unit, the anaerobic unit, the deep treatment unit and the denitrification unit are sequentially connected to form a treatment part, and the sulfuric acid treatment unit is connected to the treatment part and provides regenerated sulfuric acid for the treatment part. According to the system and the method disclosed by the invention, the semiconductor sulfuric acid waste liquid can be fully purified, and the generated sulfuric acid is utilized; the sulfuric acid waste liquid and the TMAH waste liquid are treated at the same time, other treatment equipment does not need to be additionally arranged, and the equipm</description><language>chi ; eng</language><subject>CHEMISTRY ; METALLURGY ; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240528&DB=EPODOC&CC=CN&NR=118084258A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240528&DB=EPODOC&CC=CN&NR=118084258A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DU YONGXUN</creatorcontrib><creatorcontrib>HAO FENGBO</creatorcontrib><creatorcontrib>CAO HAIYAN</creatorcontrib><creatorcontrib>CONG RIGUO</creatorcontrib><creatorcontrib>LUO ZHIGANG</creatorcontrib><creatorcontrib>CHEN SHUANG</creatorcontrib><title>Comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid</title><description>The invention relates to the technical field of resource recycling of waste liquid in the semiconductor industry, in particular to a comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid, and the system comprises a pretreatment unit, an anaerobic unit, a deep treatment unit, a denitrification unit and a sulfuric acid treatment unit. The pretreatment unit, the anaerobic unit, the deep treatment unit and the denitrification unit are sequentially connected to form a treatment part, and the sulfuric acid treatment unit is connected to the treatment part and provides regenerated sulfuric acid for the treatment part. According to the system and the method disclosed by the invention, the semiconductor sulfuric acid waste liquid can be fully purified, and the generated sulfuric acid is utilized; the sulfuric acid waste liquid and the TMAH waste liquid are treated at the same time, other treatment equipment does not need to be additionally arranged, and the equipm</description><subject>CHEMISTRY</subject><subject>METALLURGY</subject><subject>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi70KwjAYRbs4iPoOnw8gWH8gaylKF526l5Dc0kB-avJF8e1twcXN6XIu5ywLWwc3RgzwyTxBHCHZwTOld2I4kl6TAw9BUx8iJTijgtdZ8UzZ9jkaRVIZTS85FWTNI08wd-2tan7edbHopU3YfHdVbK-Xtm52GEOHNEoFD-7qe1mKvTgdzqI6_uN8AHmMQhs</recordid><startdate>20240528</startdate><enddate>20240528</enddate><creator>DU YONGXUN</creator><creator>HAO FENGBO</creator><creator>CAO HAIYAN</creator><creator>CONG RIGUO</creator><creator>LUO ZHIGANG</creator><creator>CHEN SHUANG</creator><scope>EVB</scope></search><sort><creationdate>20240528</creationdate><title>Comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid</title><author>DU YONGXUN ; HAO FENGBO ; CAO HAIYAN ; CONG RIGUO ; LUO ZHIGANG ; CHEN SHUANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN118084258A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>CHEMISTRY</topic><topic>METALLURGY</topic><topic>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</topic><toplevel>online_resources</toplevel><creatorcontrib>DU YONGXUN</creatorcontrib><creatorcontrib>HAO FENGBO</creatorcontrib><creatorcontrib>CAO HAIYAN</creatorcontrib><creatorcontrib>CONG RIGUO</creatorcontrib><creatorcontrib>LUO ZHIGANG</creatorcontrib><creatorcontrib>CHEN SHUANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>DU YONGXUN</au><au>HAO FENGBO</au><au>CAO HAIYAN</au><au>CONG RIGUO</au><au>LUO ZHIGANG</au><au>CHEN SHUANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid</title><date>2024-05-28</date><risdate>2024</risdate><abstract>The invention relates to the technical field of resource recycling of waste liquid in the semiconductor industry, in particular to a comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid, and the system comprises a pretreatment unit, an anaerobic unit, a deep treatment unit, a denitrification unit and a sulfuric acid treatment unit. The pretreatment unit, the anaerobic unit, the deep treatment unit and the denitrification unit are sequentially connected to form a treatment part, and the sulfuric acid treatment unit is connected to the treatment part and provides regenerated sulfuric acid for the treatment part. According to the system and the method disclosed by the invention, the semiconductor sulfuric acid waste liquid can be fully purified, and the generated sulfuric acid is utilized; the sulfuric acid waste liquid and the TMAH waste liquid are treated at the same time, other treatment equipment does not need to be additionally arranged, and the equipm</abstract><oa>free_for_read</oa></addata></record> |
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| title | Comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid |
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