Comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid
The invention relates to the technical field of resource recycling of waste liquid in the semiconductor industry, in particular to a comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid, and the system comprises a pretreatment unit, an anaerobi...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the technical field of resource recycling of waste liquid in the semiconductor industry, in particular to a comprehensive treatment system and method for semiconductor sulfuric acid waste liquid and TMAH waste liquid, and the system comprises a pretreatment unit, an anaerobic unit, a deep treatment unit, a denitrification unit and a sulfuric acid treatment unit. The pretreatment unit, the anaerobic unit, the deep treatment unit and the denitrification unit are sequentially connected to form a treatment part, and the sulfuric acid treatment unit is connected to the treatment part and provides regenerated sulfuric acid for the treatment part. According to the system and the method disclosed by the invention, the semiconductor sulfuric acid waste liquid can be fully purified, and the generated sulfuric acid is utilized; the sulfuric acid waste liquid and the TMAH waste liquid are treated at the same time, other treatment equipment does not need to be additionally arranged, and the equipm |
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