Tilted pvd source with rotating mount

Apparatus and methods for improving film uniformity in a physical vapor deposition (PVD) process are provided herein. In some embodiments, a PVD chamber includes a pedestal disposed within a processing region of the PVD chamber, the pedestal having an upper surface configured to support a substrate thereon; the first motor is coupled to the base; a cap assembly including a first target; a first magnetron disposed over a portion of the first target and in a region of the cover assembly maintained under atmospheric pressure; a first actuator configured to translate the first magnetron in a first direction; a second actuator configured to translate the first magnetron in a second direction; and a system controller configured to translate the first magnetron along at least a portion of the first path by causing the first actuator and the second actuator to translate the first magnetron simultaneously. 本文提供在物理气相沉积(PVD)工艺中提高膜均匀性的装置和方法。在一些实施例中，PVD腔室包含：底座，所述底座设置在PVD腔室的处理区域内，所述底座具有被配置成在其上支撑基板的上表面；第一电机，所述第一电机耦接至底座；盖组件，