Method and system for predicting distribution of chip unit performance along with process corner, terminal and medium
The invention provides a method and system for predicting distribution of chip unit performance along with a process corner, a terminal and a medium, and particularly relates to the technical field of chip design, and the scheme comprises the steps: constructing a relation between the channel length...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a method and system for predicting distribution of chip unit performance along with a process corner, a terminal and a medium, and particularly relates to the technical field of chip design, and the scheme comprises the steps: constructing a relation between the channel length of a chip unit and the target performance of the chip unit, and obtaining a target function; mapping the channel length to a process corner of the chip unit to obtain a process corner corresponding to the channel length; and predicting a result that the target performance is distributed along with a process corner based on the target function and the process corner corresponding to the channel length. According to the scheme, the incidence relation between the target performance of the chip unit and the process corner under the chip process design standard is established by utilizing the effective channel length, so that the relation between the target performance and the process corner is established, the distrib |
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