Uniform plasma linear ion source

The invention provides an ion source. The ion source may include a plasma chamber containing a plasma and an extraction assembly disposed along a side of the plasma chamber and including at least one extraction aperture. The ion source may also include an antenna assembly extending through the plasma chamber along a first axis. The antenna assembly may include a dielectric housing, a plurality of conductive antennas extending along a first axis within the dielectric housing. 本发明提供一种离子源。离子源可包含容纳等离子体的等离子体腔室和沿等离子体腔室侧面安置且包括至少一个提取孔的提取组合件。离子源可还包含沿第一轴延伸穿过等离子体腔室的天线组合件。天线组合件可包含介电外壳、在介电外壳内沿第一轴延伸的多个导电天线。