Plasma sheath electron density regulation and control system based on electrophilic substance injection and method thereof
The invention discloses a plasma sheath electron density regulation and control system based on electrophilic substance injection and a method thereof, and relates to the technical field of low-temperature plasmas. The problem of communication signal attenuation, namely communication blackout, cause...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a plasma sheath electron density regulation and control system based on electrophilic substance injection and a method thereof, and relates to the technical field of low-temperature plasmas. The problem of communication signal attenuation, namely communication blackout, caused by high electron density of a plasma sheath in the flying process of an existing high-speed aircraft in a near space section is solved. The regulation and control system comprises a three-channel cascade arc plasma source, an air inlet pipeline, a Langmuir probe and a vacuum chamber. The three-channel cascade arc plasma source is used for generating a plasma beam and conveying the plasma beam to the vacuum chamber to simulate a plasma sheath environment; the air inlet pipeline is used for injecting an electrophilic substance into the plasma sheath environment; and the Langmuir probe is used for diagnosing the plasma density change before and after the electrophilic substance is injected into the plasma sheath env |
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