Coating method for antireflection film of class-II superlattice infrared detection chip

The invention discloses a coating method for an antireflection film of a class II superlattice infrared detection chip, which comprises the following steps of: alternately coating three groups of six-layer composite film layers formed by zinc sulfide and magnesium fluoride on the surface of a substrate slice by adopting a vacuum coating method, and carrying out gradient insulation aging treatment after all coating procedures are completed. The antireflection film obtained by adopting the coating method provided by the invention is high in transmittance, high in film layer stability and large in signal amplification acting on the detector. Only two kinds of coating materials are used in the coating method, the coating process is relatively simple, and the coating method can be widely applied to the substrate part of a photoelectric chip in a second-class superlattice infrared detector to achieve the back anti-reflection effect. 本发明公开了一种二类超晶格红外探测芯片增透膜镀膜方法，采用真空镀膜方法在衬底片表面交替镀制由硫化锌和氟化镁形成的三组六层复合膜层，在全部镀膜程序完成之后进行梯度保温老