Optimized hole distribution method for smooth blasting and blasting structure

The invention provides a smooth blasting optimized hole distribution method and a blasting structure, and belongs to the technical field of smooth blasting. The smooth blasting optimization hole distribution method comprises the steps that underholing holes, auxiliary holes and peripheral holes are...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: XIAO HUIYUAN, MA RUIWU, CHENG LEI, HARA MOTOAKI, WEN YONGCHAO, YANG YI, LIU CUN, SONG JIAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator XIAO HUIYUAN
MA RUIWU
CHENG LEI
HARA MOTOAKI
WEN YONGCHAO
YANG YI
LIU CUN
SONG JIAN
description The invention provides a smooth blasting optimized hole distribution method and a blasting structure, and belongs to the technical field of smooth blasting. The smooth blasting optimization hole distribution method comprises the steps that underholing holes, auxiliary holes and peripheral holes are sequentially arranged from the center of a section to be blasted to the contour line direction according to a preset rule, the distance between the peripheral holes is set as an initial value, the peripheral holes are subjected to non-coupling charging, and the underholing holes and the auxiliary holes are subjected to coupling charging; determining a hole arrangement position range according to the peripheral eyes and the auxiliary eyes closest to the peripheral eyes; empty holes without charging are formed in the hole distribution position range; simulating the blasting effect under the current hole distribution and obtaining the back break amount; and the positions of the empty holes and the distance between the
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN117989941A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN117989941A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN117989941A3</originalsourceid><addsrcrecordid>eNrjZPD1LyjJzM2sSk1RyMjPSVVIySwuKcpMKi3JzM9TyE0tychPUUjLL1Iozs3PL8lQSMpJLC7JzEtXSMxLQXCAWkqTS0qLUnkYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbyzn6GhuaWFpaWJoaMxMWoAQwg3IQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Optimized hole distribution method for smooth blasting and blasting structure</title><source>esp@cenet</source><creator>XIAO HUIYUAN ; MA RUIWU ; CHENG LEI ; HARA MOTOAKI ; WEN YONGCHAO ; YANG YI ; LIU CUN ; SONG JIAN</creator><creatorcontrib>XIAO HUIYUAN ; MA RUIWU ; CHENG LEI ; HARA MOTOAKI ; WEN YONGCHAO ; YANG YI ; LIU CUN ; SONG JIAN</creatorcontrib><description>The invention provides a smooth blasting optimized hole distribution method and a blasting structure, and belongs to the technical field of smooth blasting. The smooth blasting optimization hole distribution method comprises the steps that underholing holes, auxiliary holes and peripheral holes are sequentially arranged from the center of a section to be blasted to the contour line direction according to a preset rule, the distance between the peripheral holes is set as an initial value, the peripheral holes are subjected to non-coupling charging, and the underholing holes and the auxiliary holes are subjected to coupling charging; determining a hole arrangement position range according to the peripheral eyes and the auxiliary eyes closest to the peripheral eyes; empty holes without charging are formed in the hole distribution position range; simulating the blasting effect under the current hole distribution and obtaining the back break amount; and the positions of the empty holes and the distance between the</description><language>chi ; eng</language><subject>AMMUNITION ; BLASTING ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; WEAPONS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240507&amp;DB=EPODOC&amp;CC=CN&amp;NR=117989941A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240507&amp;DB=EPODOC&amp;CC=CN&amp;NR=117989941A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>XIAO HUIYUAN</creatorcontrib><creatorcontrib>MA RUIWU</creatorcontrib><creatorcontrib>CHENG LEI</creatorcontrib><creatorcontrib>HARA MOTOAKI</creatorcontrib><creatorcontrib>WEN YONGCHAO</creatorcontrib><creatorcontrib>YANG YI</creatorcontrib><creatorcontrib>LIU CUN</creatorcontrib><creatorcontrib>SONG JIAN</creatorcontrib><title>Optimized hole distribution method for smooth blasting and blasting structure</title><description>The invention provides a smooth blasting optimized hole distribution method and a blasting structure, and belongs to the technical field of smooth blasting. The smooth blasting optimization hole distribution method comprises the steps that underholing holes, auxiliary holes and peripheral holes are sequentially arranged from the center of a section to be blasted to the contour line direction according to a preset rule, the distance between the peripheral holes is set as an initial value, the peripheral holes are subjected to non-coupling charging, and the underholing holes and the auxiliary holes are subjected to coupling charging; determining a hole arrangement position range according to the peripheral eyes and the auxiliary eyes closest to the peripheral eyes; empty holes without charging are formed in the hole distribution position range; simulating the blasting effect under the current hole distribution and obtaining the back break amount; and the positions of the empty holes and the distance between the</description><subject>AMMUNITION</subject><subject>BLASTING</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPD1LyjJzM2sSk1RyMjPSVVIySwuKcpMKi3JzM9TyE0tychPUUjLL1Iozs3PL8lQSMpJLC7JzEtXSMxLQXCAWkqTS0qLUnkYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbyzn6GhuaWFpaWJoaMxMWoAQwg3IQ</recordid><startdate>20240507</startdate><enddate>20240507</enddate><creator>XIAO HUIYUAN</creator><creator>MA RUIWU</creator><creator>CHENG LEI</creator><creator>HARA MOTOAKI</creator><creator>WEN YONGCHAO</creator><creator>YANG YI</creator><creator>LIU CUN</creator><creator>SONG JIAN</creator><scope>EVB</scope></search><sort><creationdate>20240507</creationdate><title>Optimized hole distribution method for smooth blasting and blasting structure</title><author>XIAO HUIYUAN ; MA RUIWU ; CHENG LEI ; HARA MOTOAKI ; WEN YONGCHAO ; YANG YI ; LIU CUN ; SONG JIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117989941A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>AMMUNITION</topic><topic>BLASTING</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>XIAO HUIYUAN</creatorcontrib><creatorcontrib>MA RUIWU</creatorcontrib><creatorcontrib>CHENG LEI</creatorcontrib><creatorcontrib>HARA MOTOAKI</creatorcontrib><creatorcontrib>WEN YONGCHAO</creatorcontrib><creatorcontrib>YANG YI</creatorcontrib><creatorcontrib>LIU CUN</creatorcontrib><creatorcontrib>SONG JIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>XIAO HUIYUAN</au><au>MA RUIWU</au><au>CHENG LEI</au><au>HARA MOTOAKI</au><au>WEN YONGCHAO</au><au>YANG YI</au><au>LIU CUN</au><au>SONG JIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Optimized hole distribution method for smooth blasting and blasting structure</title><date>2024-05-07</date><risdate>2024</risdate><abstract>The invention provides a smooth blasting optimized hole distribution method and a blasting structure, and belongs to the technical field of smooth blasting. The smooth blasting optimization hole distribution method comprises the steps that underholing holes, auxiliary holes and peripheral holes are sequentially arranged from the center of a section to be blasted to the contour line direction according to a preset rule, the distance between the peripheral holes is set as an initial value, the peripheral holes are subjected to non-coupling charging, and the underholing holes and the auxiliary holes are subjected to coupling charging; determining a hole arrangement position range according to the peripheral eyes and the auxiliary eyes closest to the peripheral eyes; empty holes without charging are formed in the hole distribution position range; simulating the blasting effect under the current hole distribution and obtaining the back break amount; and the positions of the empty holes and the distance between the</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN117989941A
source esp@cenet
subjects AMMUNITION
BLASTING
HEATING
LIGHTING
MECHANICAL ENGINEERING
WEAPONS
title Optimized hole distribution method for smooth blasting and blasting structure
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T03%3A32%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=XIAO%20HUIYUAN&rft.date=2024-05-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN117989941A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true