Preparation method of water-soluble photoresist based on triplet annihilation photon upconversion

The invention discloses a preparation method of a water-soluble photoresist based on triplet annihilation photon upconversion, which comprises the following steps of: packaging a fat-soluble photosensitizer and an annihilation agent in a hydrophobic cavity of a micelle by adopting a mode of assembling amphiphilic surfactant molecules into the micelle and utilizing the characteristics of internal hydrophobicity and external hydrophilicity of the micelle, thereby obtaining the water-soluble photoresist based on triplet annihilation photon upconversion. Dispersing in an aqueous solution; and combining the micelle molecules with a water-soluble initiator and a monomer to prepare the water-soluble photoresist based on triplet annihilation photon upconversion. And finally, transferring photon up-conversion energy to initiator molecules in a manner of exciting an up-conversion system photosensitizer by adopting continuous laser so as to initiate polymerization of the water-soluble monomer. The method disclosed by th