SRAM structure with adjustable operation speed and manufacturing method thereof

The invention provides an SRAM (Static Random Access Memory) structure with an adjustable operation speed. The SRAM structure comprises four PMOS (P-channel Metal Oxide Semiconductor) transistors PG1, PG2, PU1 and PU2 and four NMOS (N-channel Metal Oxide Semiconductor) transistors PD1, PD2, RP PD an...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: CHEN PINHAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator CHEN PINHAN
description The invention provides an SRAM (Static Random Access Memory) structure with an adjustable operation speed. The SRAM structure comprises four PMOS (P-channel Metal Oxide Semiconductor) transistors PG1, PG2, PU1 and PU2 and four NMOS (N-channel Metal Oxide Semiconductor) transistors PD1, PD2, RP PD and RP PG, wherein the PD1, the PD2 and the RP PD are pull-down tubes, the PU1 and the PU2 are ascending tubes, the PG1 and the PG2 are transmission tubes, and the RP PG is a gate tube; wherein the PG1, the PG2, the PU1, the PU2, the PD1 and the PD2 form a six-transistor SRAM (Static Random Access Memory) structure, and the six-transistor SRAM structure is controlled by signals A-WL, BL1 and BL2; the RP PD and the RP PG serve as reading ports and are controlled by signals B-WL and RP BL; the gate structures of the PU1 and the PU2 are configured for a first target work function; the gate structures of the PG1, the PG2, the PD1 and the PD2 are configured for a second target work function; and the grid structures of the
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN117976012A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN117976012A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN117976012A3</originalsourceid><addsrcrecordid>eNqNyjEKwjAUBuAsDqLe4XkAwSpYOpaiuKig7uXZ_LGRNgnJC15fBA_g9C3fVF1u1_pESWLuJEfQ20pPrF85CT8GkA-ILNY7SgHQxE7TyC4b_n7rnjRCeq9JekR4M1cTw0PC4udMLQ_7e3NcIfgWKXAHB2mbc1GUVblbF5t6-8_5AHuCN1A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SRAM structure with adjustable operation speed and manufacturing method thereof</title><source>esp@cenet</source><creator>CHEN PINHAN</creator><creatorcontrib>CHEN PINHAN</creatorcontrib><description>The invention provides an SRAM (Static Random Access Memory) structure with an adjustable operation speed. The SRAM structure comprises four PMOS (P-channel Metal Oxide Semiconductor) transistors PG1, PG2, PU1 and PU2 and four NMOS (N-channel Metal Oxide Semiconductor) transistors PD1, PD2, RP PD and RP PG, wherein the PD1, the PD2 and the RP PD are pull-down tubes, the PU1 and the PU2 are ascending tubes, the PG1 and the PG2 are transmission tubes, and the RP PG is a gate tube; wherein the PG1, the PG2, the PU1, the PU2, the PD1 and the PD2 form a six-transistor SRAM (Static Random Access Memory) structure, and the six-transistor SRAM structure is controlled by signals A-WL, BL1 and BL2; the RP PD and the RP PG serve as reading ports and are controlled by signals B-WL and RP BL; the gate structures of the PU1 and the PU2 are configured for a first target work function; the gate structures of the PG1, the PG2, the PD1 and the PD2 are configured for a second target work function; and the grid structures of the</description><language>chi ; eng</language><subject>ELECTRICITY ; INFORMATION STORAGE ; PHYSICS ; STATIC STORES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240503&amp;DB=EPODOC&amp;CC=CN&amp;NR=117976012A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240503&amp;DB=EPODOC&amp;CC=CN&amp;NR=117976012A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHEN PINHAN</creatorcontrib><title>SRAM structure with adjustable operation speed and manufacturing method thereof</title><description>The invention provides an SRAM (Static Random Access Memory) structure with an adjustable operation speed. The SRAM structure comprises four PMOS (P-channel Metal Oxide Semiconductor) transistors PG1, PG2, PU1 and PU2 and four NMOS (N-channel Metal Oxide Semiconductor) transistors PD1, PD2, RP PD and RP PG, wherein the PD1, the PD2 and the RP PD are pull-down tubes, the PU1 and the PU2 are ascending tubes, the PG1 and the PG2 are transmission tubes, and the RP PG is a gate tube; wherein the PG1, the PG2, the PU1, the PU2, the PD1 and the PD2 form a six-transistor SRAM (Static Random Access Memory) structure, and the six-transistor SRAM structure is controlled by signals A-WL, BL1 and BL2; the RP PD and the RP PG serve as reading ports and are controlled by signals B-WL and RP BL; the gate structures of the PU1 and the PU2 are configured for a first target work function; the gate structures of the PG1, the PG2, the PD1 and the PD2 are configured for a second target work function; and the grid structures of the</description><subject>ELECTRICITY</subject><subject>INFORMATION STORAGE</subject><subject>PHYSICS</subject><subject>STATIC STORES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjEKwjAUBuAsDqLe4XkAwSpYOpaiuKig7uXZ_LGRNgnJC15fBA_g9C3fVF1u1_pESWLuJEfQ20pPrF85CT8GkA-ILNY7SgHQxE7TyC4b_n7rnjRCeq9JekR4M1cTw0PC4udMLQ_7e3NcIfgWKXAHB2mbc1GUVblbF5t6-8_5AHuCN1A</recordid><startdate>20240503</startdate><enddate>20240503</enddate><creator>CHEN PINHAN</creator><scope>EVB</scope></search><sort><creationdate>20240503</creationdate><title>SRAM structure with adjustable operation speed and manufacturing method thereof</title><author>CHEN PINHAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117976012A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>ELECTRICITY</topic><topic>INFORMATION STORAGE</topic><topic>PHYSICS</topic><topic>STATIC STORES</topic><toplevel>online_resources</toplevel><creatorcontrib>CHEN PINHAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHEN PINHAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SRAM structure with adjustable operation speed and manufacturing method thereof</title><date>2024-05-03</date><risdate>2024</risdate><abstract>The invention provides an SRAM (Static Random Access Memory) structure with an adjustable operation speed. The SRAM structure comprises four PMOS (P-channel Metal Oxide Semiconductor) transistors PG1, PG2, PU1 and PU2 and four NMOS (N-channel Metal Oxide Semiconductor) transistors PD1, PD2, RP PD and RP PG, wherein the PD1, the PD2 and the RP PD are pull-down tubes, the PU1 and the PU2 are ascending tubes, the PG1 and the PG2 are transmission tubes, and the RP PG is a gate tube; wherein the PG1, the PG2, the PU1, the PU2, the PD1 and the PD2 form a six-transistor SRAM (Static Random Access Memory) structure, and the six-transistor SRAM structure is controlled by signals A-WL, BL1 and BL2; the RP PD and the RP PG serve as reading ports and are controlled by signals B-WL and RP BL; the gate structures of the PU1 and the PU2 are configured for a first target work function; the gate structures of the PG1, the PG2, the PD1 and the PD2 are configured for a second target work function; and the grid structures of the</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN117976012A
source esp@cenet
subjects ELECTRICITY
INFORMATION STORAGE
PHYSICS
STATIC STORES
title SRAM structure with adjustable operation speed and manufacturing method thereof
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T21%3A35%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHEN%20PINHAN&rft.date=2024-05-03&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN117976012A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true