High-selectivity polyamide acid-resistant nanofiltration membrane containing turger base and preparation method of high-selectivity polyamide acid-resistant nanofiltration membrane
The preparation method comprises the following steps: firstly, taking a halogenated aniline monomer and an aldehyde group monomer as raw materials, synthesizing a halogenated benzene intermediate containing the turger base under an acidic condition, then reducing the intermediate to prepare a turger...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The preparation method comprises the following steps: firstly, taking a halogenated aniline monomer and an aldehyde group monomer as raw materials, synthesizing a halogenated benzene intermediate containing the turger base under an acidic condition, then reducing the intermediate to prepare a turger base phenylenediamine (PDA-TB) functional monomer, and finally preparing the high-selectivity polyamide acid-resistant nanofiltration membrane containing the turger base. The preparation method comprises the following steps: preparing a membrane casting solution, dissolving the membrane casting solution and polyethersulfone in a polar solvent to prepare the membrane casting solution, blade-coating the membrane casting solution on a non-woven fabric, preparing a polyethersulfone supporting base membrane with the surface rich in PDA-TB through non-solvent induced phase inversion, and performing single-sided contact on a polyacyl chloride organic phase solution and the surface of the base membrane to prepare the PDA- |
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