Layout structure and design method, semiconductor structure, storage medium and electronic equipment

The invention discloses a layout structure, a design method, a semiconductor structure, a storage medium and electronic equipment. The layout structure corresponds to a semiconductor structure, and the semiconductor structure comprises a first power line, a first active region and a first grid elect...

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Bibliographische Detailangaben
Hauptverfasser: WANG LIZHU, WANG JUN, CAI YANFEI, LEI CHUANZHEN, LIAO CHUNHE, WANG DUO, CHEN NAIXIA
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a layout structure, a design method, a semiconductor structure, a storage medium and electronic equipment. The layout structure corresponds to a semiconductor structure, and the semiconductor structure comprises a first power line, a first active region and a first grid electrode. The layout structure comprises multiple unit patterns. The multiple unit pattern comprises a first power line pattern, a first active region pattern and a first gate pattern. The first power line pattern corresponds to the first power line and extends in the first direction. The first active region pattern corresponds to the first active region, and the first active region pattern passes through the first power line pattern along the second direction. The first gate pattern corresponds to the first gate, and the first gate pattern passes through the first power line pattern and the first active region pattern along the second direction. The second direction is different from the first direction. 一种版图结构和设计方法、半