APPARATUS AND METHOD FOR GENERATING A HIGH ENERGY ION BEAM
An apparatus and method for generating a high energy ion beam. The apparatus may include an ion source arranged to generate an ion beam at a first ion energy. The apparatus may further include a DC accelerator column disposed downstream of the ion source and arranged to accelerate the ion beam to a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | An apparatus and method for generating a high energy ion beam. The apparatus may include an ion source arranged to generate an ion beam at a first ion energy. The apparatus may further include a DC accelerator column disposed downstream of the ion source and arranged to accelerate the ion beam to a second ion energy, the second ion energy being greater than the first ion energy. The apparatus may include a linear accelerator disposed downstream of the DC accelerator column, the linear accelerator arranged to accelerate the ion beam to a third ion energy greater than the second ion energy.
一种用于生成高能离子射束的设备及方法。所述设备可包括离子源,所述离子源被布置成产生处于第一离子能量的离子射束。所述设备可进一步包括直流加速器柱,所述直流加速器柱设置在所述离子源下游且被布置成将所述离子射束加速到第二离子能量,所述第二离子能量大于所述第一离子能量。所述设备可包括线性加速器,所述线性加速器设置在所述直流加速器柱下游,所述线性加速器被布置成将所述离子射束加速到比所述第二离子能量大的第三离子能量。 |
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