Charging voltage control method and system for pulse corona plasma high-voltage power supply

The invention discloses a charging voltage control method and system for a pulse corona plasma high-voltage power supply, and the method comprises the steps: S1, initializing a charging PWM parameter when pulse PWM is interrupted, and starting the charging PWM; s2, ending pulse PWM interruption, and...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: FANG HAO, YU GUOPING, ZHU ZHENGTAO, DU HONG, ZHUANG ZHENGKANG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a charging voltage control method and system for a pulse corona plasma high-voltage power supply, and the method comprises the steps: S1, initializing a charging PWM parameter when pulse PWM is interrupted, and starting the charging PWM; s2, ending pulse PWM interruption, and waiting for charging PWM interruption; s3, if the charging PWM is interrupted, starting an AD converter to sample the charging voltage in the charging PWM interruption; s4, after sampling is completed, if it is judged that the charging voltage reaches a threshold value, charging PWM interruption is forbidden, and charging PWM is blocked; s5, waiting for the interruption of the next pulse PWM, and repeatedly executing the steps S1 to S4; the system comprises a parameter initialization module, an AD sampling module, a threshold comparison module and a charging closing module. According to the invention, the charging voltage can be controlled in real time, so that the charging voltage value in each plasma pulse perio