Substrate processing apparatus

The invention relates to a substrate processing apparatus. Provided is a technique capable of increasing the storage amount of cartridges without increasing the size of a conveyance device. A substrate processing apparatus according to one embodiment of the present disclosure is provided with: a fee...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HIROMI NITADORI, SATO JUNICHI, ABE TAKAHIRO, KADOBE MASATO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to a substrate processing apparatus. Provided is a technique capable of increasing the storage amount of cartridges without increasing the size of a conveyance device. A substrate processing apparatus according to one embodiment of the present disclosure is provided with: a feeding/discharging unit having a first side surface through which a container containing a substrate is fed and discharged, and a second side surface on the opposite side to the first side surface; a substrate transport unit extending in a first direction orthogonal to the second side surface; and a plurality of batch processing parts which are adjacent to each other along the length direction of the substrate conveying part, and the feeding and discharging part is provided with a first conveying device and a second conveying device which can convey the container; a first region to which the first transport device can be delivered, the first region including a plurality of first storage shelves for storing containers