Isostatic pressing graphite product production roasting device for third-generation semiconductors
The invention relates to the technical field of graphite processing, in particular to a third-generation semiconductor isostatic pressing graphite product production roasting device which comprises a roasting furnace body and a drying furnace body, guide grooves are formed in the two sides of the ro...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention relates to the technical field of graphite processing, in particular to a third-generation semiconductor isostatic pressing graphite product production roasting device which comprises a roasting furnace body and a drying furnace body, guide grooves are formed in the two sides of the roasting furnace body and the two sides of the drying furnace body, a heat insulation plate is arranged between the roasting furnace body and the drying furnace body, and the heat insulation plate is arranged in the drying furnace body. The two ends of the heat insulation plate extend into the roasting furnace body and the drying furnace body correspondingly and then are fixedly connected to the bottoms of the two guide grooves which are away from each other. In the process that isostatic pressing graphite is roasted in the roasting furnace body, the gas guiding mechanism exhausts high-temperature inert gas in the roasting furnace body outwards, the high-temperature inert gas passes through the drying furnace body in |
---|