SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus includes a plurality of processing units, an exhaust path, a gas processing device, and a controller. Gas discharged from a plurality of processing units that process a substrate by using a chemical product flows through the exhaust path. The gas processing apparatus...

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Bibliographische Detailangaben

Hauptverfasser:	TSUGAO, KEISUKE, TAKIMOTO YUJI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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