SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus includes a plurality of processing units, an exhaust path, a gas processing device, and a controller. Gas discharged from a plurality of processing units that process a substrate by using a chemical product flows through the exhaust path. The gas processing apparatus removes a target component in a gas, and includes a duct, a partition plate, a liquid supply unit, and a concentration detection unit. The conduit has a flow path. The partition plates partition the flow path into a plurality of spaces and are formed of a porous material. The liquid supply unit supplies the dissolving liquid to the partition plate. The concentration detection means detects the concentration of the target component. The controller adjusts a flow rate of the dissolving liquid based on at least one of operation information indicating an operation state of the plurality of processing units and a detection result of the concentration detection unit. 本发明提供一种基板处理设备，其包括多个处理单元、排气路径、气体处理装置和控制器。从通过使用化学产品来处理基