SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS
A substrate processing apparatus includes a plurality of processing units, an exhaust path, a gas processing device, and a controller. Gas discharged from a plurality of processing units that process a substrate by using a chemical product flows through the exhaust path. The gas processing apparatus...
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| creator | TSUGAO, KEISUKE TAKIMOTO YUJI |
| description | A substrate processing apparatus includes a plurality of processing units, an exhaust path, a gas processing device, and a controller. Gas discharged from a plurality of processing units that process a substrate by using a chemical product flows through the exhaust path. The gas processing apparatus removes a target component in a gas, and includes a duct, a partition plate, a liquid supply unit, and a concentration detection unit. The conduit has a flow path. The partition plates partition the flow path into a plurality of spaces and are formed of a porous material. The liquid supply unit supplies the dissolving liquid to the partition plate. The concentration detection means detects the concentration of the target component. The controller adjusts a flow rate of the dissolving liquid based on at least one of operation information indicating an operation state of the plurality of processing units and a detection result of the concentration detection unit.
本发明提供一种基板处理设备，其包括多个处理单元、排气路径、气体处理装置和控制器。从通过使用化学产品来处理基 |
| format | Patent |
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本发明提供一种基板处理设备，其包括多个处理单元、排气路径、气体处理装置和控制器。从通过使用化学产品来处理基</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CLEANING ; CLEANING IN GENERAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240409&DB=EPODOC&CC=CN&NR=117855087A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240409&DB=EPODOC&CC=CN&NR=117855087A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TSUGAO, KEISUKE</creatorcontrib><creatorcontrib>TAKIMOTO YUJI</creatorcontrib><title>SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS</title><description>A substrate processing apparatus includes a plurality of processing units, an exhaust path, a gas processing device, and a controller. Gas discharged from a plurality of processing units that process a substrate by using a chemical product flows through the exhaust path. The gas processing apparatus removes a target component in a gas, and includes a duct, a partition plate, a liquid supply unit, and a concentration detection unit. The conduit has a flow path. The partition plates partition the flow path into a plurality of spaces and are formed of a porous material. The liquid supply unit supplies the dissolving liquid to the partition plate. The concentration detection means detects the concentration of the target component. The controller adjusts a flow rate of the dissolving liquid based on at least one of operation information indicating an operation state of the plurality of processing units and a detection result of the concentration detection unit.
本发明提供一种基板处理设备，其包括多个处理单元、排气路径、气体处理装置和控制器。从通过使用化学产品来处理基</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgJDnUKDglyDHFVCAjyd3YNDvb0c1dwDAhwBIqFBis4-rkoOPv7hQT5-yj4uoZ4-LsouPkHKeDXxcPAmpaYU5zKC6W5GRTdXEOcPXRTC_LjU4sLEpNT81JL4p39DA3NLUxNDSzMHY2JUQMAibEw4Q</recordid><startdate>20240409</startdate><enddate>20240409</enddate><creator>TSUGAO, KEISUKE</creator><creator>TAKIMOTO YUJI</creator><scope>EVB</scope></search><sort><creationdate>20240409</creationdate><title>SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS</title><author>TSUGAO, KEISUKE ; TAKIMOTO YUJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN117855087A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TSUGAO, KEISUKE</creatorcontrib><creatorcontrib>TAKIMOTO YUJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TSUGAO, KEISUKE</au><au>TAKIMOTO YUJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS</title><date>2024-04-09</date><risdate>2024</risdate><abstract>A substrate processing apparatus includes a plurality of processing units, an exhaust path, a gas processing device, and a controller. Gas discharged from a plurality of processing units that process a substrate by using a chemical product flows through the exhaust path. The gas processing apparatus removes a target component in a gas, and includes a duct, a partition plate, a liquid supply unit, and a concentration detection unit. The conduit has a flow path. The partition plates partition the flow path into a plurality of spaces and are formed of a porous material. The liquid supply unit supplies the dissolving liquid to the partition plate. The concentration detection means detects the concentration of the target component. The controller adjusts a flow rate of the dissolving liquid based on at least one of operation information indicating an operation state of the plurality of processing units and a detection result of the concentration detection unit.
本发明提供一种基板处理设备，其包括多个处理单元、排气路径、气体处理装置和控制器。从通过使用化学产品来处理基</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING |
| title | SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS |
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